
Currently, global ITO sputtering targets are almost monopolized by a small minority of enterprises such as JX Nippon Mining & Metals, Mitsui Mining, Tosoh, Samsung, Heraeus and Umicore, in which Japanese and Korean companies account for nearly 80% of the market share. For lack of core technology, Chinese ITO sputtering target enterprises are still small in production scale, and basically in trial production or small batch production.